Kód: 06708211
Nanoparticle Engineering for Chemical-Mechanical Planarization
Autor Jea-Gun Park
Explains the physicochemical properties of nanoparticles according to each step in the chemical mechanical planarization (CMP) process, including dielectric CMP, shallow trend isolation CMP, metal CMP, poly isolation CMP and noble ... celý popis
- Jazyk:
Angličtina - Vazba: Pevná
- Počet stran: 224
Nakladatelství: Taylor & Francis Inc, 2009
- Více informací o knize
6406 Kč
Dostupnost:
50 % šance
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Více informací o knize Nanoparticle Engineering for Chemical-Mechanical Planarization
Nákupem získáte 641 bodů
Anotace knihy
Explains the physicochemical properties of nanoparticles according to each step in the chemical mechanical planarization (CMP) process, including dielectric CMP, shallow trend isolation CMP, metal CMP, poly isolation CMP and noble metal CMP. This work also presents design techniques using polymeric additives to improve CMP performance.
Parametry knihy
Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Industrial chemistry & manufacturing technologies Industrial chemistry
6406 Kč
- Plný název: Nanoparticle Engineering for Chemical-Mechanical Planarization
- Autor: Jea-Gun Park
- Jazyk: Angličtina
- Vazba: Pevná
- Počet stran: 224
- EAN: 9781420059113
- ISBN: 9781420059113
- ID: 06708211
- Nakladatelství: Taylor & Francis Inc
- Hmotnost: 570 g
- Rozměry: 234 × 156 × 20 mm
- Datum vydání: 20. February 2009
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