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Anotace knihy

Based on lecture notes that have been used by the authors for the past ten years, with revisions made each year, this book is aimed at graduate students as well as professionals and researchers involved in thin-film physics and technology. The first part of the book introduces the concept, describes the various deposition procedures and illustrates PVD methods, evaporation and sputtering. The basic physical processes of film formation are then analyzed and formulated, including methods for monitoring and measuring film thickness. This book also shows how the subject matter connects with, relates and applies to other fields. In the second part of the book, three special topics - ferromagnetic films, diffusion in thin films and mechanical properties of thin films - are discussed. Given its wide scope, this book should be relevant not just to those involved in materials science but also to engineers.

Parametry knihy

Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Mechanical engineering & materials Materials science

• Plný název: Introduction To Physics And Technology Of Thin Films, An
• Autor: Wang Yuming, Alfred Wagendristele, Wang Yuming
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 150
• EAN: 9789810216160
• ISBN: 9810216165
• ID: 05064627
• Nakladatelství: World Scientific Publishing Co Pte Ltd
• Datum vydání: 09. January 1994

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