Mohlo by se vám také líbit

Informovat o naskladnění knihy

Více informací o knize Ferroelectric Thin Films IV: Volume 361

• Parametry knihy
• Anotace
• Oblíbené z jiného soudku

Nákupem získáte 69 bodů

Anotace knihy

This book represents the latest technical information from academia, government organizations and industry on ferroelectric thin films. Highlights can be separated into four major categories: the first public technical disclosure of the materials processing and characterization of the much-acclaimed 'Y1' nonvolatile memory material; enhanced understanding of the role of electronic and ionic defects in ferroelectric thin film degradation; extensive technical progress in metalorganic chemical vapor deposition of ferroelectric thin films; and the development of enhanced process integration techniques for ferroelectric thin films with semiconductor technology. In addition, improved process technologies that are bringing the optical properties of these complex, multicomponent oxide films to the verge of commercial viability, are discussed. Topics include: layered structure ferroelectrics; characterization; photonic phenomena; process integration issues; dram thin film technology; chemical vapor deposition; solution deposition; vapor deposition; pulsed laser deposition and piezoelectric and IR thin film technology.

Parametry knihy

Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Mechanical engineering & materials Materials science

• Plný název: Ferroelectric Thin Films IV: Volume 361
• Autor: Seshu B. DesuR. RameshT. ShiosakiBruce A. Tuttle
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 623
• EAN: 9781558992627
• ISBN: 1558992626
• ID: 02060032
• Nakladatelství: Materials Research Society
• Hmotnost: 1023 g
• Rozměry: 234 × 160 × 38 mm
• Datum vydání: 08. August 1995

Oblíbené z jiného soudku

---

---

---