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Více informací o knize Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

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• Anotace
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Anotace knihy

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Parametry knihy

Zařazení knihy Knihy v angličtině Mathematics & science Physics Materials / States of matter

• Plný název: Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
• Autor: Y. Pauleau
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 363
• EAN: 9781402005244
• ISBN: 1402005245
• ID: 01414743
• Nakladatelství: Springer-Verlag New York Inc.
• Hmotnost: 747 g
• Rozměry: 235 × 155 × 26 mm
• Datum vydání: 30. April 2002

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