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Více informací o knize Chemical Etching Behaviour of a Polyimide

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Anotace knihy

Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.

Parametry knihy

Zařazení knihy Knihy v angličtině Mathematics & science Physics Nuclear physics

• Plný název: Chemical Etching Behaviour of a Polyimide
• Autor: Deep Shikha
• Jazyk: Angličtina
• Vazba: Brožovaná
• Počet stran: 28
• EAN: 9783668084186
• ISBN: 3668084181
• ID: 02848669
• Nakladatelství: Grin Publishing
• Hmotnost: 50 g
• Rozměry: 210 × 148 × 2 mm
• Datum vydání: 10. November 2015

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