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Anotace knihy

Advances in Imaging and Electron Physics, Volume 222 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. Specific chapters in this release cover Phase retrieval methods applied to coherent imaging, X-ray phase-contrast imaging: a broad overview of some fundamentals, Graphene and borophene as nanoscopic materials for electronics – with review of the physics, and more. Provides the authority and expertise of leading contributors from an international board of authors. Presents the latest release in the Advances in Imaging and Electron Physics series. Updated release includes the latest information on the Plasmon Coupling Physics, Wave Effects and their Study by Electron Spectroscopies.

Parametry knihy

Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Mechanical engineering & materials Mechanical engineering

• Plný název: Plasmon Coupling Physics
• Autor: Peter Hawkes, Martin Hytch
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 312
• EAN: 9780323989077
• ID: 37371996
• Nakladatelství: Elsevier Science & Technology
• Hmotnost: 630 g
• Rozměry: 159 × 240 × 26 mm
• Datum vydání: 21. June 2022

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