Kód: 23917018
Development of general numerical simulation tools for chemical vapor deposition (CVD) was the objective of this study. Physical models of important CVD phenomena were developed and implemented into the commercial computational flu ... celý popis
407 Kč
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Development of general numerical simulation tools for chemical vapor deposition (CVD) was the objective of this study. Physical models of important CVD phenomena were developed and implemented into the commercial computational fluid dynamics software FLUEN
407 Kč
Osobní odběr Praha, Brno a 12903 dalších
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