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Anotace knihy

This book presents state-of-the-art information regarding the extensive field of advanced lithography. Advanced lithography expands into numerous sub-fields like micro electro-mechanical system (MEMS), nano-lithography, nano-physics, etc. In optimized electron device, nano-lithography reaches up to 20 nm in size. Subsequently, we have to analyze and develop true single nanometer size lithography. One of the solutions is to analyze a fusion of bottom up and top down technologies like EB drawing and self-assembly with block copolymer. In nano-photonics and MEMS, 3D structures are required for carrying out specific functions in the devices for applications. They are formed as a result of execution of numerous techniques like stereo-lithography, sputtering, colloid lithography, deposition, dry etching, etc. This book provides the readers with valuable information about nano structure, 3D structure, nano-lithography, and elucidates the methodology, techniques and applications of nano-lithography.

Parametry knihy

Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Mechanical engineering & materials Materials science

• Plný název: Advanced Lithography
• Autor: Burton Kohler
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 260
• EAN: 9781632380166
• ISBN: 1632380161
• ID: 12434225
• Nakladatelství: NY RESEARCH PRESS
• Hmotnost: 517 g
• Rozměry: 229 × 152 × 16 mm
• Datum vydání: 09. February 2015

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