Mohlo by se vám také líbit

Více informací o knize Ion Implantation: Basics to Device Fabrication

• Parametry knihy
• Anotace
• Oblíbené z jiného soudku

Nákupem získáte 747 bodů

Anotace knihy

Ion Implantation: Basics to Device Fabrication is a collection of research dealing with several aspects of ion implantation, including basic information on the physics of devices, ion implanters, channeling implants, yield, damage and its annealing, in addition to a host of other topics. Particular attention has been paid to those techniques that provide two-dimensional profiles of damage and of dopants, a careful treatment of silicon based devices, threshold voltage control, shallow junctions, minority carrier lifetime control by metallic ion implants, and high energy implants is given in this work. This book, based on a course preceding the biannual Ion Implantation Technology Conference, is a valuable reference for physicists, chemists, materials scientists, processing, device production, device design, and ion beam engineers interested in any aspect of ion implantation, as well as a secondary text for a graduate course on the subject.

Parametry knihy

Zařazení knihy Knihy v angličtině Mathematics & science Physics Materials / States of matter

• Plný název: Ion Implantation: Basics to Device Fabrication
• Autor: Emanuele Rimini
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 393
• EAN: 9780792395201
• ISBN: 0792395204
• ID: 01398291
• Nakladatelství: Springer
• Hmotnost: 1660 g
• Rozměry: 235 × 155 × 27 mm
• Datum vydání: 31. December 1994

Oblíbené z jiného soudku

---

---

---