Fundamental Electron Interactions with Plasma Processing Gases / Nejlevnější knihy
Fundamental Electron Interactions with Plasma Processing Gases

Kód: 06796091

Fundamental Electron Interactions with Plasma Processing Gases

Autor Loucas G. Christophorou, James K. Olthoff

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy e ... celý popis

6578


Skladem u dodavatele v malém množství
Odesíláme za 10-15 dnů

Potřebujete více kusů?Máte-li zájem o více kusů, prověřte, prosím, nejprve dostupnost titulu na naši zákaznické podpoře.


Přidat mezi přání

Mohlo by se vám také líbit

Dárkový poukaz: Radost zaručena

Objednat dárkový poukazVíce informací

Více informací o knize Fundamental Electron Interactions with Plasma Processing Gases

Nákupem získáte 658 bodů

Anotace knihy

This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.

Parametry knihy

Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

6578



Osobní odběr Praha, Brno a 12903 dalších

Copyright ©2008-24 nejlevnejsi-knihy.cz Všechna práva vyhrazenaSoukromíCookies


Můj účet: Přihlásit se
Všechny knihy světa na jednom místě. Navíc za skvělé ceny.

Nákupní košík ( prázdný )

Vyzvednutí v Zásilkovně
zdarma nad 1 499 Kč.

Nacházíte se: