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Více informací o knize Modeling and Simulation of Thin-Film Processing: Volume 389

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Anotace knihy

A diverse set of materials science communities come together in this volume to review the extraordinary progress made in the development of computer simulation and modeling techniques for the prediction of film morphology, microstructure, composition, profile and structure. These techniques are rapidly moving out of the area of academic research and into technological and production design areas of thin-film-based industries. The book is loosely organized in ascending order of modeling-length scales - from atomic, up to the entire deposition reactor. Topics include: deposition and growth modeling; film morphology and topology; film microstructure; failure mechanisms; etching; process modeling and control and reactor-scale modeling.

Parametry knihy

Zařazení knihy Knihy v angličtině Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

• Plný název: Modeling and Simulation of Thin-Film Processing: Volume 389
• Autor: Michael J. FlussRobert J. KeeDavid SrolovitzCynthia A. Volkert
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 382
• EAN: 9781558992924
• ISBN: 1558992928
• ID: 02060052
• Nakladatelství: Materials Research Society
• Hmotnost: 705 g
• Rozměry: 234 × 160 × 25 mm
• Datum vydání: 02. October 1995

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