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Anotace knihy

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Parametry knihy

Zařazení knihy Knihy v angličtině Mathematics & science Physics Materials / States of matter

• Plný název: High Density Plasma Sources
• Podnázev: Design, Physics and Performance
• Autor: Popov, Oleg A. (Matsushita Electric Works, Woburn, MA, USA)
• Jazyk: Angličtina
• Vazba: Pevná
• Počet stran: 465
• EAN: 9780815513773
• ISBN: 0815513771
• ID: 04726906
• Nakladatelství: William Andrew
• Hmotnost: 815 g
• Rozměry: 229 × 152 × 36 mm
• Datum vydání: 31. December 1996

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